Intel has completed the assembly of its High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) lithography tool at the company’s R&D site in Hillsboro, Oregon. Built by ASML and delivered in ...

Nikon ASML lithography competition intensified on May 29 as CEO Yasuhiro Ohmura announced lower-priced ArF immersion tools to challenge ASML’s 80%-plus market share, while Intel and 3D Glass Solutions ...

ASML provided Intel, its first customer, with the $380 million Twinscan EXE:5000 High-NA lithography machine. Yesterday, it shipped its second High-NA EUV lithography machine to a mystery customer.

TL;DR: Intel is expanding its High-NA EUV lithography tool fleet from ASML, ordering two additional machines to advance its next-gen 14A process node. This strategic investment aims to boost Intel's ...

Intel Corp. executives today detailed a new business vision for its foundry unit, freshly renamed Intel Foundry, and revealed the most advanced chip manufacturing process on the company’s technology ...

Intel Corp. and Media Lario International S.A. have teamed up to accelerate the development of extreme ultraviolet (EUV) lithography. The companies today announced two agreements to that end that call ...

A recent report by Semianalysis has questioned Intel's timing for introducing High-NA lithography. Some subscribers prefer to save their log-in information so they do not have to enter their User ID ...

To continue reading this content, please enable JavaScript in your browser settings and refresh this page. Preview this article 1 min Intel wants to set up an ...

High Numerical Aperture (NA) lithography machines just became available earlier this year. Intel was the first global foundry to purchase one in an attempt to one-up its rivals in the race to ...